Sub 1nm is here !! Moore’s Law can’t stop !! ASML completed the design of EUV litho machine for 1nm-HKEPC Hardware process

Sub 1nm is here !! Moore’s Law can’t stop !!
ASML has completed the design of the EUV lithographic machine with 1nm process

Text: KK Wong / News Center

At the recently concluded ITF Japan 2020 conference, the Belgian semiconductor company imec announced the results of a new generation of high resolution EUV lithography (high NA EUV lithography) developed in collaboration with ASML, stressing that “Moore’s law does not will stop “, ASML EUV lithography equipment for 3nm, 2nm, 1nm and even Sub 1nm is already needed. The first high NA EUV lithography opportunity of the NXE 5000 series is expected to be commercialized by the end of 2022.

According to imec CEO and President Luc Van Den Hove, the company is working closely with ASML to jointly develop the next generation of high-resolution EUV litho technology and drive breakthroughs. Even if the process reaches 1 nm or less, the miniaturization of the process will continue. , Moore’s Law will not stop.

imec showed the development direction of logic circuits at the ITF Japan 2020 conference, where PP is the pitch of polycarbonate wiring (nm) and MP is the pitch of thin metal wiring (nm). It can be seen that FinFET technology will appear at 3nm. Barrier, the industry will develop towards technologies such as BPR, CFET and 2D atomic channels.

Currently, TSMC and SAMSUNG use EUV lithography equipment with NA = 0.33 in the 7nm process and perform the 5nm process via interpolation, but higher resolution lithography equipment at 2nm or later must be used. The basic design of the High NA EUV litho machine, the model is the NXE 5000 series, its NA = 0.55 and is expected to be commercialized in 2022, and the 3nm, 2nm, 1.5nm, 1nm and even Sub 1nm can make it fully.